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Applied Materials has introduced new semiconductor manufacturing systems to improve the performance of Gate-All-Around (GAA) transistors for 2nm and smaller chip processes. Key innovations include the Viva radical treatment system for nanosheet smoothing, the Sym3 Z Magnum etch system for precise trench formation, and the Spectral ALD system for molybdenum contact deposition, which reduces electrical resistance by up to 15%. These technologies support the energy-efficient performance gains necessary for advanced AI chips.